Document Type
Thesis
Degree
Master of Science (MS)
Major/Program
Materials Science and Engineering
First Advisor's Name
Jiuhua Chen
First Advisor's Committee Title
Committee Chair
Second Advisor's Name
Kinzy Jones
Third Advisor's Name
Wonbong Choi
Fourth Advisor's Name
Surendra Saxena
Keywords
Graphene, High Pressure, DAC, Diamond Anvil Cell, Raman Spectroscopy
Date of Defense
2012
Abstract
Due to its exceptional mechanical and electrical properties, graphene (one layer sheet of carbon atoms) has attracted a lot of attention since its discovery in 2004. The purpose of this research is to compare the Raman spectra of graphene with plasma treated graphene sheets which have been treated by changing the different parameters affecting the plasma treatment like gas flow, power and pressure and treatment time. The graphene we used for our high pressure studies are 4-5 layer CVD deposited graphene samples prepared by our collaborators in Dr. W. B. Choi’s group. First we report a Raman spectroscopy study of graphene on copper substrate at high pressures. Diamond anvil cell (DAC) was used to generate pressure. In situ Raman spectra were collected at pressures up to 10 GPa. The results indicate that the G band of graphene shifts with pressure significantly (about 5 cm-1/GPa) whereas the 2D band changes very little. The plasma treated samples were loaded into DAC. Raman spectrum was captured. Parts of the spectrum which were not related to the grapheme peak position were eliminated. The background was reduced. Peaks were found and fitted using FITYK software and the shift of each peak compared to its last position was observed when the pressure was increased. Next we studied plasma treated graphene samples treated with different partial pressure treatments under high pressure and compared them to each other using zirconia anvil cell with the same method.
Identifier
FI12071109
Recommended Citation
Hadjikhani, Ali, "Raman Spectroscopy Study of Graphene Under High Pressure" (2012). FIU Electronic Theses and Dissertations. 656.
https://digitalcommons.fiu.edu/etd/656
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